Robot for simultaneous substrate transfer

ABSTRACT

Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a transfer apparatus having a central hub including a shaft extending at a distal end through the transfer region housing into the transfer region. The transfer apparatus may include a lateral translation apparatus coupled with an exterior surface of the transfer region housing, and configured to provide at least one direction of lateral movement of the shaft. The systems may also include an end effector coupled with the shaft within the transfer region. The end effector may include a plurality of arms having a number of arms equal to a number of substrate supports of the plurality of substrate supports in the transfer region.

CROSS-REFERENCES TO RELATED APPLICATIONS

This application claims the benefit of priority of U.S. ProvisionalPatent Application No. 62/873,480, filed 12 Jul. 2019, the content ofwhich is hereby incorporated by reference in its entirety for allpurposes. The present technology is further related to the followingapplications, all concurrently filed 12 Jul. 2019, and titled: “ROBOTFOR SIMULTANEOUS SUBSTRATE TRANSFER” (U.S. Provisional PatentApplication No. 62/873,400), “ROBOT FOR SIMULTANEOUS SUBSTRATE TRANSFER”(U.S. Provisional Patent Application No. 62/873,432), “ROBOT FORSIMULTANEOUS SUBSTRATE TRANSFER” (U.S. Provisional Patent ApplicationNo. 62/873,458), “MULTI-LID STRUCTURE FOR SEMICONDUCTOR PROCESSINGSYSTEMS” (U.S. Provisional Patent Application No. 62/873,518), and“HIGH-DENSITY SUBSTRATE PROCESSING SYSTEMS AND METHODS” (U.S.Provisional Patent Application No. 62/873,503). Each of theseapplications is hereby incorporated by reference in their entirety forall purposes.

TECHNICAL FIELD

The present technology relates to semiconductor processes and equipment.More specifically, the present technology relates to substrate handlingsystems.

BACKGROUND

Semiconductor processing systems often utilize cluster tools tointegrate a number of process chambers together. This configuration mayfacilitate the performance of several sequential processing operationswithout removing the substrate from a controlled processing environment,or it may allow a similar process to be performed on multiple substratesat once in the varying chambers. These chambers may include, forexample, degas chambers, pretreatment chambers, transfer chambers,chemical vapor deposition chambers, physical vapor deposition chambers,etch chambers, metrology chambers, and other chambers. The combinationof chambers in a cluster tool, as well as the operating conditions andparameters under which these chambers are run, are selected to fabricatespecific structures using particular process recipes and process flows.

Cluster tools often process a number of substrates by continuouslypassing substrates through a series of chambers and process operations.The process recipes and sequences will typically be programmed into amicroprocessor controller that will direct, control, and monitor theprocessing of each substrate through the cluster tool. Once an entirecassette of wafers has been successfully processed through the clustertool, the cassette may be passed to yet another cluster tool orstand-alone tool, such as a chemical mechanical polisher, for furtherprocessing.

Robots are typically used to transfer the wafers through the variousprocessing and holding chambers. The amount of time required for eachprocess and handling operation has a direct impact on the throughput ofsubstrates per unit of time. Substrate throughput in a cluster tool maybe directly related to the speed of the substrate handling robotpositioned in a transfer chamber. As processing chamber configurationsare further developed, conventional wafer transfer systems may beinadequate.

Thus, there is need for improved systems and methods that can be used toefficiently direct substrates within cluster tool environments. Theseand other needs are addressed by the present technology.

SUMMARY

Exemplary substrate processing systems may include a transfer regionhousing defining a transfer region fluidly coupled with a plurality ofprocessing regions. A sidewall of the transfer region housing may definea sealable access for providing and receiving substrates. A plurality ofsubstrate supports may be disposed within the transfer region. Thesystems may include a transfer apparatus having a central hub includinga shaft extending at a distal end through the transfer region housinginto the transfer region. The transfer apparatus may include a lateraltranslation apparatus coupled with an exterior surface of the transferregion housing. The lateral translation apparatus may be configured toprovide at least one direction of lateral movement of the shaft. Thesystems may also include an end effector coupled with the shaft at thedistal end of the shaft within the transfer region. The end effector mayinclude a plurality of arms having a number of arms equal to a number ofsubstrate supports of the plurality of substrate supports.

In some embodiments, the plurality of substrate supports may include atleast four substrate supports. The transfer apparatus may include afirst drive coupled with the shaft and configured to rotate the shaftabout a central axis through the shaft. The first drive may include aframeless motor extending about the shaft. The transfer apparatus mayinclude a second drive coupled with the shaft and configured to providevertical translation of the shaft. The first drive may be containedwithin a housing coupled with guides along which the second drive maydirect the housing, and which may vertically translates the first driveand the shaft. The lateral translation apparatus may include a firststage translatable in a first lateral direction, and the central hub maybe coupled with the first stage. The lateral translation apparatus mayinclude a second stage translatable in a second lateral direction, andthe second stage may be vertically aligned and coupled with the firststage. The second lateral direction may be orthogonal to the firstlateral direction. The transfer apparatus may include a bellows throughwhich the shaft extends. The bellows may be fixedly coupled with abaseplate of the transfer apparatus at a first end. The bellows may besized to afford lateral translation of the shaft within a volume of thebellows.

Some embodiments of the present technology may encompass transferapparatuses including a baseplate defining a central aperture. Theapparatuses may include a shaft, a distal end of which may at leastpartially extend through the central aperture of the baseplate. Theapparatuses may include a lateral translation apparatus coupled with thebaseplate. The lateral translation apparatus may be configured toprovide at least one direction of lateral movement of the shaft withinthe central aperture of the baseplate. The apparatuses may include abellows coupled with the baseplate and axially aligned with the centralaperture of the baseplate. The shaft may at least partially extendthrough the bellows. The apparatuses may include a first drive coupledwith the shaft and configured to rotate the shaft about a central axisof the shaft.

In some embodiments, the transfer apparatuses may include a supportcoupled with the lateral translation apparatus. The support may includeone or more guides extending vertically along a surface of the supportfacing the shaft. The shaft may at least partially be contained within ahousing, and the housing may be movably coupled with the guides of thesupport. A first end of the bellows may be coupled with the baseplate,and a second end of the bellows may be coupled with the housing. Theapparatuses may include a second drive coupled with a base of thesupport. The second drive may be configured to drive the housingvertically along the guides of the support providing verticaltranslation of the shaft. The second drive may be laterally offset fromthe first drive. The second drive may be axially aligned with the firstdrive. The lateral translation apparatus may include a first stagecoupled with the baseplate and translatable in a first lateraldirection. The bellows may at least partially extend through the firststage. The lateral translation apparatus may include a second stagetranslatable in a second lateral direction orthogonal to the firstlateral direction. The second stage may be vertically aligned with andcoupled with the first stage. The bellows may at least partially extendthrough the second stage.

Some embodiments of the present technology may encompass substrateprocessing systems. The systems may include a transfer region housingdefining a transfer region fluidly coupled with a plurality ofprocessing regions. A sidewall of the transfer region housing may definea sealable access for providing and receiving substrates. A base of thetransfer region housing may define an aperture. The systems may includea plurality of substrate supports disposed within the transfer region.The systems may include a transfer apparatus within the transfer region.The transfer apparatus may include a baseplate defining a centralaperture. The baseplate may be coupled with an exterior of the base ofthe transfer region housing. The central aperture of the baseplate mayextend about the aperture through the base of the transfer regionhousing. The transfer apparatus may include a shaft, a distal end ofwhich may at least partially extend through the central aperture of thebaseplate. The transfer apparatus may also include a lateral translationapparatus coupled with the baseplate. The lateral translation apparatusmay be configured to provide at least one direction of lateral movementof the shaft within the central aperture of the baseplate. The transferapparatus may include a bellows coupled with the baseplate and axiallyaligned with the central aperture of the baseplate. The shaft may atleast partially extend through the bellows. The transfer apparatus mayalso include an end effector coupled with the shaft at the distal end ofthe shaft within the transfer region. The end effector may include aplurality of arms configured to support substrates.

Such technology may provide numerous benefits over conventional systemsand techniques. For example, the transfer systems may provide lateraltransfer capabilities in addition to rotational movement for substratetransfer. Additionally, the transfer systems may accommodate or limitbending, rotational, and other moments with configurations according tosome embodiments of the present technology. These and other embodiments,along with many of their advantages and features, are described in moredetail in conjunction with the below description and attached figures.

BRIEF DESCRIPTION OF THE DRAWINGS

A further understanding of the nature and advantages of the disclosedtechnology may be realized by reference to the remaining portions of thespecification and the drawings.

FIG. 1A shows a schematic top plan view of one embodiment of anexemplary processing tool according to some embodiments of the presenttechnology.

FIG. 1B shows a schematic partial cross-sectional view of one embodimentof an exemplary processing system according to some embodiments of thepresent technology.

FIG. 2 shows a schematic isometric view of a transfer section of anexemplary substrate processing system according to some embodiments ofthe present technology.

FIG. 3 shows a schematic isometric view of an exemplary transferapparatus according to some embodiments of the present technology.

FIG. 4 shows a schematic cross-sectional view of an exemplary transferapparatus according to some embodiments of the present technology.

FIG. 5 shows a schematic isometric view of an exemplary transferapparatus according to some embodiments of the present technology.

FIG. 6 shows a schematic cross-sectional elevation view of a transfersection of an exemplary substrate processing system according to someembodiments of the present technology.

Several of the figures are included as schematics. It is to beunderstood that the figures are for illustrative purposes, and are notto be considered of scale or proportion unless specifically stated to beof scale or proportion. Additionally, as schematics, the figures areprovided to aid comprehension and may not include all aspects orinformation compared to realistic representations, and may includeexaggerated material for illustrative purposes.

In the appended figures, similar components and/or features may have thesame reference label. Further, various components of the same type maybe distinguished by following the reference label by a letter thatdistinguishes among the similar components. If only the first referencelabel is used in the specification, the description is applicable to anyone of the similar components having the same first reference labelirrespective of the letter.

DETAILED DESCRIPTION

Substrate processing can include time-intensive operations for adding,removing, or otherwise modifying materials on a wafer or semiconductorsubstrate. Efficient movement of the substrate may reduce queue timesand improve substrate throughput. To improve the number of substratesprocessed within a cluster tool, additional chambers may be incorporatedonto the mainframe. Although transfer robots and processing chambers canbe continually added by lengthening the tool, this may become spaceinefficient as the footprint of the cluster tool scales. Accordingly,the present technology may include cluster tools with an increasednumber of processing chambers within a defined footprint. To accommodatethe limited footprint about transfer robots, the present technology mayincrease the number of processing chambers laterally outward from therobot. For example, some conventional cluster tools may include one ortwo processing chambers positioned about sections of a centrally locatedtransfer robot to maximize the number of chambers radially about therobot. The present technology may expand on this concept byincorporating additional chambers laterally outward as another row orgroup of chambers. For example, the present technology may be appliedwith cluster tools including three, four, five, six, or more processingchambers accessible at each of one or more robot access positions.

However, as additional process locations are added, accessing theselocations from a central robot may no longer be feasible withoutadditional transfer capabilities at each location. Some conventionaltechnologies may include wafer carriers on which the substrates remainseated during transition. However, wafer carriers may contribute tothermal non-uniformity and particle contamination on substrates. Thepresent technology overcomes these issues by incorporating a transfersection vertically aligned with processing chamber regions and acarousel or transfer apparatus that may operate in concert with acentral robot to access additional wafer positions. The presenttechnology may not use conventional wafer carriers in some embodiments,and may transfer specific wafers from one substrate support to adifferent substrate support within the transfer region. Although theremaining disclosure will routinely identify specific structures, suchas four-position transfer regions, for which the present structures andmethods may be employed, it will be readily understood that the systemsand methods are equally applicable to any number of structures anddevices that may benefit from the transfer capabilities explained.Accordingly, the technology should not be considered to be so limited asfor use with any particular structures alone. Moreover, although anexemplary tool system will be described to provide foundation for thepresent technology, it is to be understood that the present technologycan be incorporated with any number of semiconductor processing chambersand tools that may benefit from some or all of the operations andsystems to be described.

FIG. 1A shows a top plan view of one embodiment of a substrateprocessing tool or processing system 100 of deposition, etching, baking,and curing chambers according to some embodiments of the presenttechnology. In the figure, a set of front-opening unified pods 102supply substrates of a variety of sizes that are received within afactory interface 103 by robotic arms 104 a and 104 b and placed into aload lock or low pressure holding area 106 before being delivered to oneof the substrate processing regions 108, positioned in chamber systemsor quad sections 109 a-c, which may each be a substrate processingsystem having a transfer region fluidly coupled with a plurality ofprocessing regions 108. Although a quad system is illustrated, it is tobe understood that platforms incorporating standalone chambers, twinchambers, and other multiple chamber systems are equally encompassed bythe present technology. A second robotic arm 110 housed in a transferchamber 112 may be used to transport the substrate wafers from theholding area 106 to the quad sections 109 and back, and second roboticarm 110 may be housed in a transfer chamber with which each of the quadsections or processing systems may be connected. Each substrateprocessing region 108 can be outfitted to perform a number of substrateprocessing operations including any number of deposition processesincluding cyclical layer deposition, atomic layer deposition, chemicalvapor deposition, physical vapor deposition, as well as etch, pre-clean,anneal, plasma processing, degas, orientation, and other substrateprocesses.

Each quad section 109 may include a transfer region that may receivesubstrates from, and deliver substrates to, second robotic arm 110. Thetransfer region of the chamber system may be aligned with the transferchamber having the second robotic arm 110. In some embodiments thetransfer region may be laterally accessible to the robot. In subsequentoperations, components of the transfer sections may vertically translatethe substrates into the overlying processing regions 108. Similarly, thetransfer regions may also be operable to rotate substrates betweenpositions within each transfer region. The substrate processing regions108 may include any number of system components for depositing,annealing, curing and/or etching a material film on the substrate orwafer. In one configuration, two sets of the processing regions, such asthe processing regions in quad section 109 a and 109 b, may be used todeposit material on the substrate, and the third set of processingchambers, such as the processing chambers or regions in quad section 109c, may be used to cure, anneal, or treat the deposited films. In anotherconfiguration, all three sets of chambers, such as all twelve chambersillustrated, may be configured to both deposit and/or cure a film on thesubstrate.

As illustrated in the figure, second robotic arm 110 may include twoarms for delivering and/or retrieving multiple substratessimultaneously. For example, each quad section 109 may include twoaccesses 107 along a surface of a housing of the transfer region, whichmay be laterally aligned with the second robotic arm. The accesses maybe defined along a surface adjacent the transfer chamber 112. In someembodiments, such as illustrated, the first access may be aligned with afirst substrate support of the plurality of substrate supports of a quadsection. Additionally, the second access may be aligned with a secondsubstrate support of the plurality of substrate supports of the quadsection. The first substrate support may be adjacent to the secondsubstrate support, and the two substrate supports may define a first rowof substrate supports in some embodiments. As shown in the illustratedconfiguration, a second row of substrate supports may be positionedbehind the first row of substrate supports laterally outward from thetransfer chamber 112. The two arms of the second robotic arm 110 may bespaced to allow the two arms to simultaneously enter a quad section orchamber system to deliver or retrieve one or two substrates to substratesupports within the transfer region.

Any one or more of the transfer regions described may be incorporatedwith additional chambers separated from the fabrication system shown indifferent embodiments. It will be appreciated that additionalconfigurations of deposition, etching, annealing, and curing chambersfor material films are contemplated by processing system 100.Additionally, any number of other processing systems may be utilizedwith the present technology, which may incorporate transfer systems forperforming any of the specific operations, such as the substratemovement. In some embodiments, processing systems that may provideaccess to multiple processing chamber regions while maintaining a vacuumenvironment in various sections, such as the noted holding and transferareas, may allow operations to be performed in multiple chambers whilemaintaining a particular vacuum environment between discrete processes.

FIG. 1B shows a schematic cross-sectional elevation view of oneembodiment of an exemplary processing tool, such as through a chambersystem, according to some embodiments of the present technology. FIG. 1Bmay illustrate a cross-sectional view through any two adjacentprocessing regions 108 in any quad section 109. The elevation view mayillustrate the configuration or fluid coupling of one or more processingregions 108 with a transfer region 120. For example, a continuoustransfer region 120 may be defined by a transfer region housing 125. Thehousing may define an open interior volume in which a number ofsubstrate supports 130 may be disposed. For example, as illustrated inFIG. 1A, exemplary processing systems may include four or more,including a plurality of substrate supports 130 distributed within thehousing about the transfer region. The substrate supports may bepedestals as illustrated, although a number of other configurations mayalso be used. In some embodiments the pedestals may be verticallytranslatable between the transfer region 120 and the processing regionsoverlying the transfer region. The substrate supports may be verticallytranslatable along a central axis of the substrate support along a pathbetween a first position and a second position within the chambersystem. Accordingly, in some embodiments each substrate support 130 maybe axially aligned with an overlying processing region 108 defined byone or more chamber components.

The open transfer region may afford the ability of a transfer apparatus135, such as a carousel, to engage and move substrates, such asrotationally, between the various substrate supports. The transferapparatus 135 may be rotatable about a central axis. This may allowsubstrates to be positioned for processing within any of the processingregions 108 within the processing system. The transfer apparatus 135 mayinclude one or more end effectors that may engage substrates from above,below, or may engage exterior edges of the substrates for movement aboutthe substrate supports. The transfer apparatus may receive substratesfrom a transfer chamber robot, such as robot 110 described previously.The transfer apparatus may then rotate substrates to alternate substratesupports to facilitate delivery of additional substrates.

Once positioned and awaiting processing, the transfer apparatus mayposition the end effectors or arms between substrate supports, which mayallow the substrate supports to be raised past the transfer apparatus135 and deliver the substrates into the processing regions 108, whichmay be vertically offset from the transfer region. For example, and asillustrated, substrate support 130 a may deliver a substrate intoprocessing region 108 a, while substrate support 130 b may deliver asubstrate into processing region 108 b. This may occur with the othertwo substrate supports and processing regions, as well as withadditional substrate supports and processing regions in embodiments forwhich additional processing regions are included. In this configuration,the substrate supports may at least partially define a processing region108 from below when operationally engaged for processing substrates,such as in the second position, and the processing regions may beaxially aligned with an associated substrate support. The processingregions may be defined from above by a faceplate 140, as well as otherlid stack components. In some embodiments, each processing region mayhave individual lid stack components, although in some embodimentscomponents may accommodate multiple processing regions 108. Based onthis configuration, in some embodiments each processing region 108 maybe fluidly coupled with the transfer region, while being fluidlyisolated from above from each other processing region within the chambersystem or quad section.

In some embodiments the faceplate 140 may operate as an electrode of thesystem for producing a local plasma within the processing region 108. Asillustrated, each processing region may utilize or incorporate aseparate faceplate. For example, faceplate 140 a may be included todefine from above processing region 108 a, and faceplate 140 b may beincluded to define from above processing region 108 b. In someembodiments the substrate support may operate as the companion electrodefor generating a capacitively-coupled plasma between the faceplate andthe substrate support. A pumping liner 145 may at least partially definethe processing region 108 radially, or laterally depending on the volumegeometry. Again, separate pumping liners may be utilized for eachprocessing region. For example, pumping liner 145 a may at leastpartially radially define processing region 108 a, and pumping liner 145b may at least partially radially define processing region 108 b. Ablocker plate 150 may be positioned between a lid 155 and the faceplate140 in embodiments, and again separate blocker plates may be included tofacilitate fluid distribution within each processing region. Forexample, blocker plate 150 a may be included for distribution towardsprocessing region 108 a, and blocker plate 150 b may be included fordistribution towards processing region 108 b.

Lid 155 may be a separate component for each processing region, or mayinclude one or more common aspects. In some embodiments, such asillustrated, lid 155 may be a single component defining multipleapertures 160 for fluid delivery to individual processing regions. Forexample, lid 155 may define a first aperture 160 a for fluid delivery toprocessing region 108 a, and lid 155 may define a second aperture 160 bfor fluid delivery to processing region 108 b. Additional apertures maybe defined for additional processing regions within each section whenincluded. In some embodiments, each quad section 109—ormulti-processing-region section that may accommodate more or less thanfour substrates, may include one or more remote plasma units 165 fordelivering plasma effluents into the processing chamber. In someembodiments individual plasma units may be incorporated for each chamberprocessing region, although in some embodiments fewer remote plasmaunits may be used. For example, as illustrated a single remote plasmaunit 165 may be used for multiple chambers, such as two, three, four, ormore chambers up to all chambers for a particular quad section. Pipingmay extend from the remote plasma unit 165 to each aperture 160 fordelivery of plasma effluents for processing or cleaning in embodimentsof the present technology.

As noted, processing system 100, or more specifically quad sections orchamber systems incorporated with processing system 100 or otherprocessing systems, may include transfer sections positioned below theprocessing chamber regions illustrated. FIG. 2 shows a schematicisometric view of a transfer section of an exemplary chamber system 200according to some embodiments of the present technology. FIG. 2 mayillustrate additional aspects or variations of aspects of the transferregion 120 described above, and may include any of the components orcharacteristics described. The system illustrated may include a transferregion housing 205 defining a transfer region in which a number ofcomponents may be included. The transfer region may additionally be atleast partially defined from above by processing chambers or processingregions fluidly coupled with the transfer region, such as processingchamber regions 108 illustrated in quad sections 109 of FIG. 1A. Asidewall of the transfer region housing may define one or more accesslocations 207 through which substrates may be delivered and retrieved,such as by second robotic arm 110 as discussed above. Access locations207 may be slit valves or other sealable access positions, which includedoors or other sealing mechanisms to provide a hermetic environmentwithin transfer region housing 205 in some embodiments. Althoughillustrated with two such access locations 207, it is to be understoodthat in some embodiments only a single access location 207 may beincluded, as well as access locations on multiple sides of the transferregion housing. It is also to be understood that the transfer sectionillustrated may be sized to accommodate any substrate size, including200 mm, 300 mm, 450 mm, or larger or smaller substrates, includingsubstrates characterized by any number of geometries or shapes.

Within transfer region housing 205 may be a plurality of substratesupports 210 positioned about the transfer region volume. Although foursubstrate supports are illustrated, it is to be understood that anynumber of substrate supports are similarly encompassed by embodiments ofthe present technology. For example, greater than or about three, four,five, six, eight, or more substrate supports 210 may be accommodated intransfer regions according to embodiments of the present technology.Second robotic arm 110 may deliver a substrate to either or both ofsubstrate supports 210 a or 210 b through the accesses 207. Similarly,second robotic arm 110 may retrieve substrates from these locations.Lift pins 212 may protrude from the substrate supports 210, and mayallow the robot to access beneath the substrates. The lift pins may befixed on the substrate supports, or at a location where the substratesupports may recess below, or the lift pins may additionally be raisedor lowered through the substrate supports in some embodiments. Substratesupports 210 may be vertically translatable, and in some embodiments mayextend up to processing chamber regions of the substrate processingsystems, such as processing chamber regions 108, positioned above thetransfer region housing 205.

The transfer region housing 205 may provide access 215 for alignmentsystems, which may include an aligner that can extend through anaperture of the transfer region housing as illustrated and may operatein conjunction with a laser, camera, or other monitoring deviceprotruding or transmitting through an adjacent aperture, and that maydetermine whether a substrate being translated is properly aligned.Transfer region housing 205 may also include a transfer apparatus 220that may be operated in a number of ways to position substrates and movesubstrates between the various substrate supports. In one example,transfer apparatus 220 may move substrates on substrate supports 210 aand 210 b to substrate supports 210 c and 210 d, which may allowadditional substrates to be delivered into the transfer chamber.Additional transfer operations may include rotating substrates betweensubstrate supports for additional processing in overlying processingregions.

Transfer apparatus 220 may include a central hub 225 that may includeone or more shafts extending into the transfer chamber. Coupled with theshaft may be an end effector 235. End effector 235 may include aplurality of arms 237 extending radially or laterally outward from thecentral hub. Although illustrated with a central body from which thearms extend, the end effector may additionally include separate armsthat are each coupled with the shaft or central hub in variousembodiments. Any number of arms may be included in embodiments of thepresent technology. In some embodiments a number of arms 237 may besimilar or equal to the number of substrate supports 210 included in thechamber. Hence, as illustrated, for four substrate supports, transferapparatus 220 may include four arms extending from the end effector. Thearms may be characterized by any number of shapes and profiles, such asstraight profiles or arcuate profiles, as well as including any numberof distal profiles including hooks, rings, forks, or other designs forsupporting a substrate and/or providing access to a substrate, such asfor alignment or engagement.

The end effector 235, or components or portions of the end effector, maybe used to contact substrates during transfer or movement. Thesecomponents as well as the end effector may be made from or include anumber of materials including conductive and/or insulative materials.The materials may be coated or plated in some embodiments to withstandcontact with precursors or other chemicals that may pass into thetransfer chamber from an overlying processing chamber.

Additionally, the materials may be provided or selected to withstandother environmental characteristics, such as temperature. In someembodiments, the substrate supports may be operable to heat a substratedisposed on the support. The substrate supports may be configured toincrease a surface or substrate temperature to temperatures greater thanor about 100° C., greater than or about 200° C., greater than or about300° C., greater than or about 400° C., greater than or about 500° C.,greater than or about 600° C., greater than or about 700° C., greaterthan or about 800° C., or higher. Any of these temperatures may bemaintained during operations, and thus components of the transferapparatus 220 may be exposed to any of these stated or encompassedtemperatures. Consequently, in some embodiments any of the materials maybe selected to accommodate these temperature regimes, and may includematerials such as ceramics and metals that may be characterized byrelatively low coefficients of thermal expansion, or other beneficialcharacteristics.

Component couplings may also be adapted for operation in hightemperature and/or corrosive environments. For example, where endeffectors and end portions are each ceramic, the coupling may includepress fittings, snap fittings, or other fittings that may not includeadditional materials, such as bolts, which may expand and contract withtemperature, and may cause cracking in the ceramics. In some embodimentsthe end portions may be continuous with the end effectors, and may bemonolithically formed with the end effectors. Any number of othermaterials may be utilized that may facilitate operation or resistanceduring operation, and are similarly encompassed by the presenttechnology.

The transfer apparatus 220 may include a number of components andconfigurations that may facilitate the movement of the end effector inmultiple directions, which may facilitate rotational movement, as wellas vertical movement, or lateral movement in one or more ways with thedrive system components to which the end effector may be coupled. FIG. 3shows a schematic isometric view of an exemplary transfer apparatus 300according to some embodiments of the present technology, although it isto be understood that any other configurations affording the rotational,vertical, and/or lateral movement to be described are similarlyencompassed by the present technology.

The transfer apparatus 300 may include a baseplate 305, which may becoupled with a transfer chamber housing in one or more ways, and mayoperate as central hub 225 having a variety of components coupled orassociated with the baseplate in embodiments of the present technology.For example, baseplate 305 may couple with an exterior of transferregion housing 205 previously illustrated, such as with flange 307, oran outer portion of the baseplate. A portion of baseplate 305 may extendthrough or at least partially within a base of the transfer chamberhousing, such as through an aperture defined in the transfer regionhousing, and may be centrally located within the transfer region housingin some embodiments.

A shaft 310 may extend through the baseplate 305 into a transfer regionvolume, and may support an end effector as previously described. The endeffector may couple with a distal end of shaft 310 extending into thetransfer region. In some embodiments, baseplate 305 may be the onlycomponent coupled with the transfer region housing, and the othercomponents of transfer apparatus 300 may have limited or no contact withthe transfer chamber housing. Baseplate 305 may define an aperture 308through which shaft 310 may extend. Aperture 308 may be at leastpartially aligned with the aperture through the transfer region housingin some embodiments, and aperture 308 may be sized to accommodate anamount of lateral movement of shaft 310 as will be described furtherbelow.

Coupled with baseplate 305 may be a lateral translation apparatus 315,which may be coupled on a surface of the baseplate 305 opposite asurface coupled with a transfer region housing. Lateral translationapparatus 315 may include a number of components affording movement inone or more directions along a plane orthogonal to a central axisthrough shaft 310 in some embodiments, and may allow lateral movement ofthe shaft within the central aperture of the baseplate. Lateraltranslation apparatus 315 may include a first stage 320, a portion ofwhich may be coupled with baseplate 305. First stage 320 may include anumber of components as will be described below, and may include one ormore guides that may be driven by a motor to move components coupledwith the stage in a first direction normal to a central axis through theshaft 310.

In some embodiments lateral translation apparatus 315 may also include asecond stage 325, a portion of which may be coupled with first stage320. Second stage 325 may include components similar to first stage 320,and in some embodiments first stage 320 and second stage 325 may besimilar or identical. The stages may be offset in one or more ways tofacilitate additional translational capabilities. For example, in someembodiments second stage 325 may afford component movement in a seconddirection normal to a central axis through the shaft 310. The seconddirection may also be offset from the first direction, and in someembodiments the second direction may be orthogonal to the firstdirection within a plane orthogonal to the central axis through theshaft 310. Accordingly, lateral translation apparatus 315 may provide atleast one direction of lateral movement of components of the transferapparatus 300, including shaft 310, and an end effector coupled with theshaft. Aspects of the lateral translation apparatus will be discussedfurther below. Lateral movement of shaft 310 may provide increasedcontrol over a substrate within a processing chamber, and may allowcorrection of the substrate position for delivery to a substrate supportto ensure accuracy and limit damage to the substrate due tomisalignment.

Coupled with lateral translation apparatus 315 may be a supportstructure 330, which may extend from lateral translation apparatus 315in some embodiments. Shaft 310 may extend through the lateraltranslation apparatus 315 at a distal end extending into a transferregion housing or other chamber. A proximal end of shaft 310 may becoupled with one or more drive systems for moving shaft 310, and acoupled end effector, in one or more ways. FIG. 3 illustrates oneembodiment of a first drive 335 configured to produce rotationalmovement of shaft 310. First drive 335 may be any number of drives ormotors producing rotation of shaft 310 about a central axis of shaft310. As illustrated in the figure, one embodiment may include a motorextending about shaft 310, and concentric with the shaft. The motor maybe any type of motor and may couple with the shaft in a number of waysto rotate the shaft. As one non-limiting example, a frameless motor mayextend about the shaft, and a rotor may magnetically couple with theshaft or may incorporate a number of bearings coupling with the shaft.Any other type of drive system, such as a belt-drive system, agear-drive system, or other system configured to rotate the shaft may beused.

A housing 340 may extend about one or more components in someembodiments, and may at least partially extend about the shaft. Firstdrive 335 may be contained within the housing 340 in some embodiments,although additional embodiments may include aspects of first drive 335external to the housing, as will be described further below. Housing 340may be coupled with support structure 330 in some embodiments in whichthe transfer apparatus 300 provides vertical movement in addition torotational movement and/or lateral movement of shaft 310. In someembodiments, support structure 330 may include one or more guides 345,such as linear guides or rails, along which housing 340 may be driven.Attached to housing 340 may be one or more brackets or bearings allowingthe housing to translate along and be moveably coupled with the guides345. This may vertically translate the housing and shaft, which may thenallow vertical motion of the end effector to facilitate engaging anddisengaging substrates between the transfer apparatus and substratesupports. A second drive 350 may be coupled with the housing 340 and orthe shaft 310, which may include any number of motors or materials todrive the shaft and/or other components along the linear guides onsupport structure 330. As illustrated in FIG. 3, in some embodiments thefirst drive and the second drive may be vertically aligned with theshaft to limit moments during operation. For example, as illustrated,the second drive 350 may be centrally mounted on a base of the supportstructure 330, and in line with both the shaft and first drive. This maylessen or limit any rotational or bending moments on the transfer deviceand associated components, such as shaft 310.

FIG. 4 shows a schematic cross-sectional view through exemplary transferapparatus 300 according to some embodiments of the present technology,which may illustrate additional components of the system. Thecross-sectional view may illustrate exemplary couplings betweencomponents, as well as one example of alignment of the components of thetransfer apparatus 300. For example, the figure shows alignment ofsecond drive 350 with shaft 310 along with a concentric alignment offirst drive 335 with shaft 310.

In some embodiments the transfer region into which the shaft 310 mayextend may be under vacuum conditions. Some embodiments of the presenttechnology may maintain each of the drive components external to thevacuum environment. To accommodate both different environmentalpressures as well as the movement of the shaft, a bellows 355 and seal360 may also be incorporated within the system. Bellows 355 may extendabout the shaft, and shaft 310 may at least partially extend through thebellows at a distal end before entering a transfer region. Bellows 355may be axially aligned with the aperture through baseplate 305, throughwhich shaft 310 may extend. Bellows 355 may be coupled with a surface ofthe baseplate 305, such as at a second surface opposite a first surface,with which the baseplate 305 may be coupled with a transfer regionhousing. The bellows 355 may be fixedly coupled with the baseplate 305at a first end 357 of the bellows. A second end 359 of the bellows maybe coupled, including fixedly coupled with the housing 340. Seal 360,which may be a lip seal or other sealing device, may extend about theshaft 310 and abut the bellows to produce a pressure differential, wherethrough bellows and about the distal end of shaft 310 may be maintainedat a pressure of the transfer region environment, while the otherillustrated components of transfer apparatus 300 may be maintained athigher pressure, for example. Because of the temperatures to whichcomponents of transfer apparatus 300 may be exposed, this configurationmay also facilitate cooling baseplate 305, as well as housing 340 andcomponents included therein, which may limit temperature effects on thecomponents. For example, jacketing including fluid cooling jacketing maybe extended about either of these components to limit the temperature ofcomponents during processing operations. Additional cooling maysimilarly be used and is also encompassed by the present technology.

Bellows 355 may accommodate vertical translation of the shaft 310 byflexing with the movement of the housing. Additionally, bellows 355 maybe specifically configured to accommodate lateral movement of the shaft310. As previously discussed, lateral translation apparatus 315 may becoupled with baseplate 305. As illustrated, first stage 320 of lateraltranslation device 315 may also include linear guides or rails alongwhich the stage may move. For example, rails of first stage 320 may becoupled with baseplate 305, and first stage 320 may be driven alongthese rails in a first direction, such as orthogonal to a plane of thecross-section illustrated. A motor may be coupled with the first stageto drive the stage along the rails. Similarly, second stage 325 may becoupled with first stage 320, and may be rotated, such as ninetydegrees, from first stage 320 to provide lateral movement in the sameplane but orthogonal to first stage 320. A second motor, such as motor327 may drive the second stage along rails that may be coupled with thefirst stage. Support structure 330 may be coupled with the second stage,and thus operation of the first stage and/or second stage may move eachof the associated components, which may be coupled with the structure orwith other components coupled with the structure. Hence, the movement ofeither stage will indirectly move the shaft laterally within theaperture through baseplate 305.

The movement may also move the shaft laterally within the bellows 355,as well as at least partially move aspects of the bellows in someembodiments. As shown, both first stage 320 and second stage 325 maydefine an aperture through which the bellows 355 may extend. As notedpreviously, bellows 355 may be coupled with baseplate 305 at first end357 of the bellows, which may not move during operation of the firststage and/or second stage. However, the second end 359 of bellows 355,which may be coupled with the housing 340, may move when the structureand associated components including housing 340 are moved with the firststage and second stage. Thus, second end 359 of bellows 355 may deflectlaterally, and become vertically offset from first end 357. Shaft 310may maintain a central alignment with second end 359 of bellows 355, asthese components may move together. Shaft 310 may, however, move towardsinternal radial edges of first end 357 of bellows 355 during thesemovements, as a position of first end 357 may remain fixed duringlateral movements. Consequently, in some embodiments, a diameter ofbellows 355 at first end 357 may be sized to accommodate the lateralmovement of shaft 310, and the second end of bellows 355, to ensureshaft 310 may not contact bellows 355. The diameter of bellows 355 maybe maintained constant along the length of the bellows, or may flarefrom the second end 359 towards the first end 357, to accommodate themovement and limit or prevent contact between the shaft 310 andsidewalls or ends of the bellows.

Additionally illustrated in FIG. 4 are further details of the seconddrive 350, which may couple with components in one or more ways. Forexample, second drive 350 may include a ball-screw motor, or any othermotor which may provide vertical linear translation of a componentcoupled with a shaft of the motor. As illustrated, second drive 350 maybe coupled with a base of support structure 330, and may be coupled withshaft 310 through housing 340, such as with a ball nut or othertransition device allowing rotation of the drive shaft or screw whilethe nut and associated components, such as the housing and shaft, remainfixed rotationally while translating vertically. Consequently, transferapparatus 300 may provide one or more, including multiple, movements ofshaft 310, which may include one or more of rotational movement withfirst drive 335, vertical movement with second drive 350, and lateralmovement with lateral translation apparatus 315.

Additional configurations of a transfer apparatus are also encompassedby the present technology, which may not include the axial alignment ofthe first drive and second drive as illustrated above. FIG. 5 shows aschematic isometric view of an exemplary transfer apparatus 400according to some embodiments of the present technology. Transferapparatus 400 may be similar to transfer apparatus 300 in one or moreways, and may include any of the components, materials, orconfigurations described previously, even if not expressly illustratedin the figure, and may further illustrate some aspects of transferapparatus 300 described above.

For example, transfer apparatus 400 may include a baseplate 405 that maybe coupled with a transfer region housing as previously described.Baseplate 405 may define a central aperture, or general aperture,through which a shaft 410 may extend. An end effector may be coupledwith a distal end of the shaft 410 as previously described. The shaft410 may also extend through a bellows 455, which may extend throughapertures through a lateral translation apparatus 415. The lateraltranslation apparatus may include one or more stages having componentsallowing lateral movement of the shaft, which may be indirectly coupledwith the lateral translation apparatus. In some embodiments, lateraltranslation apparatus 415 may include a first stage 420 affordinglateral movement in a first linear direction, which may be driven by amotor 422. Additionally, in some embodiments lateral translationapparatus 415 may include a second stage 425 affording lateral movementin a second linear direction in the same plane as and orthogonal to thefirst linear direction. Second stage 425 may be driven by a motor 427 insome embodiments.

Coupled with lateral translation apparatus 415 may be a supportstructure 430, which may include guides as previously discussed, alongwhich housing 440, along with shaft 410, may be vertically translated.FIG. 5 illustrates an embodiment in which first drive 435 may not extendabout shaft 410, and may be positioned externally from housing 440.First drive 435 may still be coupled with shaft 410 through housing 440to provide rotational movement of shaft 410, although a different motor,such as a servo motor or other motor may be included providingrotational capabilities for shaft 410 rotation. Second drive 450 mayalso be included in some embodiments to provide vertical translationcapabilities as previously described. However, in some embodimentssecond drive 450 may be laterally offset, as well as vertically offset,from first drive 435. Second drive 450 may be coupled with housing 440,or bearings of housing 440 allowing housing 440 to be translated alongguides of structure 430. In some embodiments such as illustrated, seconddrive 450 may not be coupled with shaft 410, although movement withsecond drive 450 of housing 440, in which shaft 410 may be contained,may still vertically translate the shaft 410 as well. Accordingly, anumber of configurations may be accommodated by the present technologyto provide the multiple movements of a shaft, and associated endeffector, which may allow rotation, as well as vertical and/or lateralmovement of substrates within a transfer region of a processing system.

FIG. 6 shows a schematic cross-sectional elevation view of an exemplarytransfer region of a substrate processing system 500 according to someembodiments of the present technology. FIG. 6 illustrates a staggeredlift pin configuration as previously described, and as may be includedin any of the transfer chambers or substrate handling systems previouslydescribed. For example, any of the lift pins described previously mayinclude staggered height lift pins as illustrated. Substrate handlingsystem 500 may include any of the components, configurations, andcharacteristics of any of the previously described embodiments, andsimilarly any previously described system may include the lift pinconfiguration illustrated. System 500 may include a plurality ofsubstrates 501 individually positioned on sets of lift pins 505 withinthe chamber, which may also include a transfer apparatus 520, which mayinclude features of any of the transfer apparatuses previouslydescribed, including arms 535 extending from the transfer apparatus.Additionally, the transfer apparatus 520 may include a shaft 522 towhich an end effector having arms 535 may be coupled. Shaft 522 may alsoextend through an aperture of the base of transfer region housing, andextend to any of the transfer apparatus drive systems discussed above orotherwise encompassed by the present technology, including drive systemsof transfer apparatus 300 and transfer apparatus 400, for example.

Lift pins 505 may be sets of pins that extend from substrate supports510 to provide accessibility for delivering or retrieving a substrate501, and each set may include any number of pins to accommodate asubstrate. As illustrated, lift pin sets 505 are staggered at fourdifferent heights, which may allow individual delivery and retrieval ofsubstrates. For example, lift pins 505 a may extend a first verticallength above a substrate support. Lift pins 505 b may extend a secondvertical length above substrate support 510 b illustrated in thecross-section, and which may hide a substrate support from which liftpins 505 a may extend, although the substrate supports may be in line.The second vertical length may be less than the first vertical length asshown.

Additionally, lift pins 505 c may extend a third vertical length fromsubstrate support 510 c, and the third vertical length may be less thanthe second vertical length. Finally, lift pins 505 d may extend a fourthvertical length from an associated substrate support, which may behidden by and in line with substrate support 510 c. The fourth verticallength may be less than the third vertical length. By staggering theheights of the lift pin sets, individual adjustments may be made to eachsubstrate prior to delivery or retrieval of the substrates. For example,when disposed on the associated lift pins, substrate 501 a may beaccessible above substrate 501 b, which may be accessible abovesubstrate 501 c, and which may be accessible above substrate 501 d.

The present technology includes substrate processing systems that mayaccommodate additional substrate supports that may not otherwise beaccessible to centrally located transfer robots as previously described.By incorporating transfer apparatuses according to embodiments of thepresent technology, multiple substrate supports may be utilized andaccessed during substrate processing. When transfer apparatuses includedrive systems as described above, lateral translation may be provided inaddition to rotational translation and vertical translation.Additionally, transfer apparatus configurations according to someembodiments of the present technology may align components in one ormore ways to limit moments during operation of the system, which mayprovide additional control for fine-tune movement of substrates duringtransition within a transfer region of a processing system.

In the preceding description, for the purposes of explanation, numerousdetails have been set forth in order to provide an understanding ofvarious embodiments of the present technology. It will be apparent toone skilled in the art, however, that certain embodiments may bepracticed without some of these details, or with additional details.

Having disclosed several embodiments, it will be recognized by those ofskill in the art that various modifications, alternative constructions,and equivalents may be used without departing from the spirit of theembodiments. Additionally, a number of well-known processes and elementshave not been described in order to avoid unnecessarily obscuring thepresent technology. Accordingly, the above description should not betaken as limiting the scope of the technology. Additionally, methods orprocesses may be described as sequential or in steps, but it is to beunderstood that the operations may be performed concurrently, or indifferent orders than listed.

Where a range of values is provided, it is understood that eachintervening value, to the smallest fraction of the unit of the lowerlimit, unless the context clearly dictates otherwise, between the upperand lower limits of that range is also specifically disclosed. Anynarrower range between any stated values or unstated intervening valuesin a stated range and any other stated or intervening value in thatstated range is encompassed. The upper and lower limits of those smallerranges may independently be included or excluded in the range, and eachrange where either, neither, or both limits are included in the smallerranges is also encompassed within the technology, subject to anyspecifically excluded limit in the stated range. Where the stated rangeincludes one or both of the limits, ranges excluding either or both ofthose included limits are also included.

As used herein and in the appended claims, the singular forms “a”, “an”,and “the” include plural references unless the context clearly dictatesotherwise. Thus, for example, reference to “a substrate” includes aplurality of such substrates, and reference to “the arm” includesreference to one or more arms and equivalents thereof known to thoseskilled in the art, and so forth.

Also, the words “comprise(s)”, “comprising”, “contain(s)”, “containing”,“include(s)”, and “including”, when used in this specification and inthe following claims, are intended to specify the presence of statedfeatures, integers, components, or operations, but they do not precludethe presence or addition of one or more other features, integers,components, operations, acts, or groups.

The invention claimed is:
 1. A substrate processing system comprising: atransfer region housing defining a transfer region fluidly coupled witha plurality of processing regions, wherein a sidewall of the transferregion housing defines a sealable access for providing and receivingsubstrates; a plurality of substrate supports disposed within thetransfer region; and a transfer apparatus comprising: a central hubincluding a shaft extending at a distal end through the transfer regionhousing into the transfer region, a lateral translation apparatuscoupled with an exterior surface of the transfer region housing, thelateral translation apparatus configured to provide at least onedirection of lateral movement of the shaft, and an end effector coupledwith the shaft at the distal end of the shaft within the transferregion, the end effector comprising a plurality of arms having a numberof arms equal to a number of substrate supports of the plurality ofsubstrate supports.
 2. The substrate processing system of claim 1,wherein the plurality of substrate supports comprises at least foursubstrate supports.
 3. The substrate processing system of claim 1,further comprising a first drive coupled with the shaft and configuredto rotate the shaft about a central axis through the shaft.
 4. Thesubstrate processing system of claim 3, wherein the first drivecomprises a frameless motor extending about the shaft.
 5. The substrateprocessing system of claim 4, further comprising a second drive coupledwith the shaft and configured to provide vertical translation of theshaft.
 6. The substrate processing system of claim 5, wherein the firstdrive is contained within a housing coupled with guides along which thesecond drive directs the housing, and which vertically translates thefirst drive and the shaft.
 7. The substrate processing system of claim1, wherein the lateral translation apparatus comprises a first stagetranslatable in a first lateral direction, and wherein the central hubis coupled with the first stage.
 8. The substrate processing system ofclaim 7, wherein the lateral translation apparatus comprises a secondstage translatable in a second lateral direction, and wherein the secondstage is vertically aligned and coupled with the first stage.
 9. Thesubstrate processing system of claim 8, wherein the second lateraldirection is orthogonal to the first lateral direction.
 10. Thesubstrate processing system of claim 1, further comprising a bellowsthrough which the shaft extends, wherein the bellows is fixedly coupledwith a baseplate of the transfer apparatus at a first end, and whereinthe bellows is sized to afford lateral translation of the shaft within avolume of the bellows.
 11. A transfer apparatus comprising: a baseplatedefining a central aperture; a shaft, a distal end of which at leastpartially extends through the central aperture of the baseplate; alateral translation apparatus coupled with the baseplate, the lateraltranslation apparatus configured to provide at least one direction oflateral movement of the shaft within the central aperture of thebaseplate; a bellows coupled with the baseplate and axially aligned withthe central aperture of the baseplate, wherein the shaft at leastpartially extends through the bellows; a first drive coupled with theshaft and configured to rotate the shaft about a central axis of theshaft; and a support coupled with the lateral translation apparatus,wherein the support comprises: one or more guides extending verticallyalong a surface of the support facing the shaft.
 12. The transferapparatus of claim 11, wherein the shaft is at least partially containedwithin a housing, wherein the housing is movably coupled with the guidesof the support.
 13. The transfer apparatus of claim 12, wherein a firstend of the bellows is coupled with the baseplate, and wherein a secondend of the bellows is coupled with the housing.
 14. The transferapparatus of claim 12, further comprising a second drive coupled with abase of the support, wherein the second drive is configured to drive thehousing vertically along the guides of the support providing verticaltranslation of the shaft.
 15. The transfer apparatus of claim 14,wherein the second drive is laterally offset from the first drive. 16.The transfer apparatus of claim 14, wherein the second drive is axiallyaligned with the first drive.
 17. The transfer apparatus of claim 11,wherein the lateral translation apparatus comprises a first stagecoupled with the baseplate and translatable in a first lateraldirection, and wherein the bellows at least partially extends throughthe first stage.
 18. The transfer apparatus of claim 17, wherein thelateral translation apparatus comprises a second stage translatable in asecond lateral direction orthogonal to the first lateral direction, andwherein the second stage is vertically aligned with and coupled with thefirst stage, and wherein the bellows at least partially extends throughthe second stage.
 19. A substrate processing system comprising: atransfer region housing defining a transfer region fluidly coupled witha plurality of processing regions, wherein a sidewall of the transferregion housing defines a sealable access for providing and receivingsubstrates, and wherein a base of the transfer region housing defines anaperture; a plurality of substrate supports disposed within the transferregion; and a transfer apparatus comprising: a baseplate defining acentral aperture, wherein the baseplate is coupled with an exterior ofthe base of the transfer region housing, and wherein the centralaperture of the baseplate extends about the aperture through the base ofthe transfer region housing; a shaft, a distal end of which at leastpartially extends through the central aperture of the baseplate; alateral translation apparatus coupled with the baseplate, the lateraltranslation apparatus configured to provide at least one direction oflateral movement of the shaft within the central aperture of thebaseplate; a bellows coupled with the baseplate and axially aligned withthe central aperture of the baseplate, wherein the shaft at leastpartially extends through the bellows; and an end effector coupled withthe shaft at the distal end of the shaft within the transfer region, theend effector comprising a plurality of arms configured to supportsubstrates.